Associate Editors

Deputy Editor-in-Chief

  • Derong Liu, Guangdong University of Technology, China
  • Zhongping Jiang, New York University, USA
  • Qinglai Wei , Chinese Academy of Sciences, China

Associate Editors

  • Cesare Alippi, Politecnico di Milano, Italy
  • Panos J. Antsaklis, University of Notre Dame, USA

  • Tamer Basar, University of Illinois, USA

  • Dimitri P. Bertsekas, Massachusetts Institute of Technology, USA

  • Bijnan Bandyopadhyay, Indian Institute of Technology Bombay, India

  • Zhengcai Cao, Beijing University of Chemical Technology, China

  • Long Chen, University of Macau, Macau

  • C. L. Philip Chen, University of Macau, Macau
  • Mo-Yuen Chow, Shanghai Jiaotong University, China

  • Weiping Ding, Nantong University, China

  • Daoyi Dong, University of New South Wales, Australia

  • Giuseppe Franzè, University of Calabria, Italy

  • Shangce Gao, University of Toyama, Japan

  • Weinan Gao, Florida Institute of Technology, USA

  • Fengling Han, Royal Melbourne Institute of Technology, Australia

  • Wei He, University of Science & Technology Beijing, China

  • Zengguang Hou, Chinese Academy of Sciences, China

  • Tingwen Huang, Texas A&M University at Qatar, Qatar

  • Biao Huang, University of Alberta, Canada

  • Frank L. Lewis, The University of Texas at Arlington, USA

  • Hongyi Li, Guangdong University of Technology, China

  • Shuai Li, Swansea University, UK

  • Chenglin Liu, Chinese Academy of Sciences, China

  • Honghai Liu, University of Portsmouth, UK

  • Lichuan Liu, Northern Illinois University, USA

  • Xiaoping Liu, Carleton University, Canada

  • Yan-Jun Liu, Liaoning University of Technology, China

  • Xin Luo, Chinese Academy of Sciences, China

  • Yan Lu, NIST, USA

  • Antonio Marcus Nogueira Lima, Universidade Federal de Campina Grande, Brazil

  • Xiaoxiang Na, University of Cambridge, UK

  • Thomas Parisini, University of Trieste, Italy

  • Marios M. Polycarpou, University of Cyprus, Cyprus

  • Xuemin Shen, University of Waterloo, Canada

  • Jinhua She, Tokyo University of Technology, Japan

  • Lei Shu, University of Lincoln, UK

  • Zhen Song, Siemens Corporation, USA

  • Fei-Yue Wang, Chinese Academy of Sciences, China

  • Jiacun Wang, Monmouth University, USA

  • Shouguang Wang, Zhejiang Gongshang University, China

  • Zidong Wang, Brunel University London, UK

  • Donald C. Wunsch II, Missouri University of Science and Technology, USA

  • Yang Xiang, Swinburne University of Technology, Australia

  • Peter Xiong, Microsoft, USA

  • Tao Yang, Northeastern University, China

  • Hui Yu, Pouthmoth University, UK

  • Huaguang Zhang, Northeastern University, China

  • Jun Zhang, Denver University, USA

  • Nian Zhang, University of the District of Columbia, USA

  • Jinyun Zhang, Mitsubishi Electric Research Laboratories, USA

  • Mengchu Zhou, New Jersey Institute of Technology, USA


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